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High resolution cathodoluminescence hyperspectral imaging of surface features in InGaN/GaN multiple quantum well structures

机译:InGaN / GaN多量子阱结构中表面特征的高分辨率阴极发光高光谱成像

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摘要

InGaN/GaN multiple quantum wells (MQWs) have been studied by using cathodoluminescence hyperspectral imaging with high spatial resolution. Variations in peak emission energies and intensities across trenchlike features and V-pits on the surface of the MQWs are investigated. The MQW emission from the region inside trenchlike features is redshifted by approximately 45 meV and more intense than the surrounding planar regions of the sample, whereas emission from the V-pits is blueshifted by about 20 meV and relatively weaker. By employing this technique to the studied nanostructures it is possible to investigate energy and intensity shifts on a 10 nm length scale.
机译:通过使用具有高空间分辨率的阴极发光高光谱成像技术研究了InGaN / GaN多量子阱(MQW)。研究了MQW表面上沟槽状特征和V形凹坑的峰值发射能量和强度的变化。沟槽状特征内部区域的MQW发射发生红移约45 meV,并且比样品周围的平面区域更强烈,而V型凹坑的发射发生蓝移约20 meV并且相对较弱。通过将此技术应用于研究的纳米结构,可以研究10 nm长度尺度上的能量和强度位移。

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